Sign In | Join Free | My burrillandco.com
Home > Optical Electron Beam Coating Machine >

Compact High-Precision Electron Beam Evaporation Coating Machine for Versatile Optical Coating Applications

Guangdong Zhongda Vacuum Equipment Co., Ltd.
Trust Seal
Verified Supplier
Credit Check
Supplier Assessment
Contact Now
    Buy cheap Compact High-Precision Electron Beam Evaporation Coating Machine for Versatile Optical Coating Applications from wholesalers
     
    Buy cheap Compact High-Precision Electron Beam Evaporation Coating Machine for Versatile Optical Coating Applications from wholesalers
    • Buy cheap Compact High-Precision Electron Beam Evaporation Coating Machine for Versatile Optical Coating Applications from wholesalers
    • Product Details
    • Company Profile

    Compact High-Precision Electron Beam Evaporation Coating Machine for Versatile Optical Coating Applications

    Small Electron Beam Evaporation Coating Machines
    Core Technical Specifications
    Parameter CategoryDetails
    Substrate CapacityMax size: Up to 6-inch (150mm); Compatible with 2"/4"/6" wafers/optical components; Min size: 10×10mm
    Vacuum PerformanceUltimate vacuum: ≤ 1×10⁻⁶ Torr (1.3×10⁻⁴ Pa); Pumping time: minutes to 5×10⁻⁶ Torr; Leak rate: 10⁻³ Pa*L/s (He leak test)
    Evaporation SystemElectron beam power: 250W-10kW; Number of crucibles/pockets: 4-8; Supports rod (max φ4mm) & crucible (1-15cc) feedstock
    Process ControlSubstrate temperature: RT-500℃ (±1℃ precision); Rotation speed: 2-20 rpm; Film thickness monitor: QCM (0.01 nm/s resolution)
    Film QualityUniformity: ±1%-±3%; Adhesion: Meets ASTM D3359 4B standard; Deposition rate: 0.1-10 nm/s
    CompatibilityMaterials: Au, Ag, Pt, W, SiO₂, TiO₂, MgF₂, YF₃, ZrO₂ (supports AR/AF/reflective films)
    Physical DimensionsFootprint: 1-3.3×3.0m; Height: 2.5-3.5m; Weight: <800kg (desktop/tabletop models)
    Power SupplySingle/Three-phase: 220V/380V, 50/60Hz; Power consumption: 1.2kW-10kW
    Key Advantages
    Compact & Space-Saving Design
    • Desktop/modular structure with Korvus HEX-800 standard, ideal for laboratory/research settings
    • Easy integration with glove boxes for inert-atmosphere processes
    • Lightweight construction and tool-free module replacement reduce installation & maintenance costs
    High-Precision & Reliable Coating
    • Electron beam focusing technology enables deposition of refractory metals (Pt, W) and dielectric materials
    • 0.01nm/s thickness control with film uniformity ±1% (industry-leading for small-scale equipment)
    • Hall ion source + Ar plasma pre-cleaning enhances film adhesion (4B grade) and density
    • Meets optical component performance requirements (e.g., AR films with >95% transmittance)
    Versatile & Flexible Process Adaptation
    • Supports 4-8 crucibles/pockets for multi-material co-evaporation
    • Quick switch between metal, oxide, and organic films (AF/AR/reflective/protective coatings)
    • Compatible with 2"-6" substrates (wafers, lenses, optical fibers)
    • Customizable fixtures (dome/knudzin/plate) for 2D/3D components
    Intelligent & User-Friendly Operation
    • PLC + touchscreen control system with real-time process monitoring
    • Pre-programmed process libraries for quick setup
    • Energy-efficient cryopump/magnetic suspension molecular pump design reduces power consumption by 30% vs. traditional systems
    Cost-Effective for R&D & Small-Batch Production
    • Low initial investment with high target utilization rate (>70%) and minimal material waste
    • Suitable for prototyping to small-batch manufacturing (up to 10,000 pieces/year)
    • Multi-functional integration (e-beam evaporation + sputtering optional) eliminates need for multiple devices
    Core Functions
    Precise Heating and Evaporation
    • High-energy electron beams bombard target material surfaces, heating to molten or evaporated state
    • Concentrated energy and high thermal efficiency enable evaporation of refractory materials (tungsten, molybdenum, titanium, SiO₂, TiO₂)
    • Avoids contamination of target material by heating source
    • Supports multi-target material switching (2-6 crucible positions) for continuous deposition of single-layer and multi-layer films
    Precise Film Thickness Control
    • Built-in quartz crystal film thickness monitor for real-time deposition rate and thickness monitoring
    • Control accuracy to nanometer level (±0.1nm) for ultra-thin functional films
    • Programmable control system with preset deposition parameters (electron beam power, vacuum degree, deposition rate)
    • Automated coating ensures batch film layer consistency
    High Vacuum Environment Guarantee
    • Mechanical pump + molecular pump vacuum unit reduces cavity to 10⁻⁴~10⁻⁶ Pa high vacuum environment
    • Reduces gas molecule scattering and contamination of evaporated particles
    • Ensures film layers have high purity, good density and strong adhesion
    Small-Sized Workpiece Adaptation
    • Designed specifically for small workpieces with rotary workpiece table
    • Improves coating layer uniformity across substrates
    • Suitable for substrates ranging from millimeters to tens of millimeters (wafers, optical lenses, chips, sensor components)
    • Supports coating of surface mount, sheet, and small parts
    Quality Compact High-Precision Electron Beam Evaporation Coating Machine for Versatile Optical Coating Applications for sale
    Inquiry Cart 0
    Send your message to this supplier
     
    *From:
    *To: Guangdong Zhongda Vacuum Equipment Co., Ltd.
    *Subject:
    *Message:
    Characters Remaining: (0/3000)